Conditioning brushes complement polishing pads

PR Hoffman conditioning brushes ofer improvement in technical polishing processes by the removal of embedded materials from the surface of polishing pads by the use of conditioning brushes. In addition, significant process stability and pad life improvements can be achieved by using conditioning brushes on frequent, fixed schedule. This type of conditioning brush is commonly used by manufacturers of hard-disk substrates, silicon, GaAs, glass, optics, quartz and other single and double-sided applications. The conditioning brushes are available for all double-sided lapping and polishing machines. Each brush is custom designed based on specific application and pad requirements.